Damascene phase change memory

ABSTRACT

A phase change material may include a pore formed of a relatively smaller phase change material and a relatively larger resistance heater. As a result, the relatively smaller portion of phase change material may have improved properties.

BACKGROUND

This invention relates generally to phase change memories.

Phase change memory devices use phase change materials, i.e., materialsthat may be electrically switched between a generally amorphous and agenerally crystalline state, as an electronic memory. One type of memoryelement utilizes a phase change material that may be, in oneapplication, electrically switched between generally amorphous andgenerally crystalline local orders or between the different detectablestates of local order across the entire spectrum between completelyamorphous and completely crystalline states.

Typical materials suitable for such an application include variouschalcogenide elements. The state of the phase change materials is alsonon-volatile. When the memory is set in either a crystalline,semi-crystalline, amorphous, or semi-amorphous state representing aresistance value, that value is retained until reprogrammed, even ifpower is removed. This is because the program value represents a phaseor physical state of the memory (e.g., crystalline or amorphous).

Thus, there is a need for better ways to form phase change memories.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 is a partially schematic depiction of one embodiment of thepresent invention;

FIG. 2 is an enlarged, cross-sectional view at an early stage ofmanufacture in accordance with one embodiment of the present invention;

FIG. 3 is an enlarged, cross-sectional view at a subsequent stage ofmanufacture in accordance with one embodiment of the present invention;

FIG. 4 is an enlarged, cross-sectional view at a subsequent stage ofmanufacture in accordance with one embodiment of the present invention;

FIG. 5 is an enlarged, cross-sectional view at still a subsequent stageof manufacture in accordance with one embodiment of the presentinvention;

FIG. 6 is an enlarged, cross-sectional view at a subsequent stage ofmanufacture in accordance with one embodiment of the present invention;

FIG. 7 is an enlarged, cross-sectional view at a subsequent stage of oneembodiment of the present invention; and

FIG. 8 is a schematic system depiction in accordance with one embodimentof the present invention.

DETAILED DESCRIPTION

Referring to FIG. 1, a phase change memory 11 may have a select device24 that selects the phase change memory by coupling the memory to aconductive line 26 that in one embodiment may be a row line. The selectdevice 24 may be a diode or a transistor, as two examples. Anotherconductive line 22 is positioned over the phase change memory device. Aconductive line 22 may be a column line in one embodiment of the presentinvention. However, it should be understood that the designations ofrows and columns are generally arbitrary.

In general, the structure depicted in FIG. 1 is a cell of a phase changememory 11 that may include a large number of similarly situated cellsaddressable on rows and columns.

In one embodiment of the present invention, the select device 24 and theline 26 may be formed in a semiconductor substrate 10. A layer ofinsulating material 12 is positioned over the substrate 10. A conductiveelectrode 16 may form a heater that extends through a pore defined inthe insulating layer 12. In one embodiment of the present invention, theelectrode 16 takes up more of the available vertical extent of pore thandoes the phase change material 20 a. The material 20 a of one cell maybe isolated from the phase change material of other cells.

In one embodiment, the phase change material 20 a may be a non-volatile,phase change material. A phase change material may be a material havingelectrical properties (e.g., resistance) that may be changed through theapplication of energy such as, for example, heat, light, voltagepotential, or electrical current.

Examples of phase change materials may include a chalcogenide materialor an ovonic material. An ovonic material may be a material thatundergoes electronic or structural changes and acts as a semiconductoronce subjected to application of a voltage potential, electricalcurrent, light, heat, etc. A chalcogenide material may be a materialthat includes at least one element from column VI of the periodic tableor may be a material that includes one or more of the chalcogenelements, e.g., any of the elements of tellurium, sulfur, or selenium.Ovonic and chalcogenide materials may be non-volatile memory materialsthat may be used to store information.

In one embodiment, the memory material may be chalcogenide elementcomposition from the class of tellurium-germanium-antimony(Te_(x)Ge_(y)Sb_(z)) material or a GeSbTe alloy, although the scope ofthe present invention is not limited to just these materials.

In one embodiment, if the memory material is a non-volatile, phasechange material, the memory material may be programmed into one of atleast two memory states by applying an electrical signal to the memorymaterial. An electrical signal may alter the phase of the memorymaterial between a substantially crystalline state and a substantiallyamorphous state, wherein the electrical resistance of the memorymaterial in the substantially amorphous state is greater than theresistance of the memory material in the substantially crystallinestate. Accordingly, in this embodiment, the memory material may beadapted to be altered to one of at least two resistance values within arange of resistance values to provide single bit or multi-bit storage ofinformation.

Programming of the memory material to alter the state or phase of thematerial may be accomplished by applying voltage potentials to the lines22 and 26, thereby generating a voltage potential across the memorymaterial 20 a. An electrical current may flow through a portion of thememory material 20 a and for the electrode 16 in response to the appliedvoltage potentials, and may result in heating of the memory material 20a.

This heating and subsequent cooling may alter the memory state or phaseof the memory material 20 a. Altering the phase or state of the memorymaterial 20 a may alter an electrical characteristic of the memorymaterial 20 a. For example, resistance of the material 20 a may bealtered by altering the phase of the memory material 20 a. The memorymaterial may also be referred to as a programmable resistive material orsimply a programmable material.

In one embodiment, a voltage potential difference of about 3 volts maybe applied across a portion of the memory material by applying about 3volts to a lower line 26 and about zero volts to an upper line 26. Acurrent flowing through the memory material 20 a in response to theapplied voltage potentials may result in heating of the memory material.This heating and subsequent cooling may alter the memory state or phaseof the material.

In a “reset” state, the memory material may be in an amorphous orsemi-amorphous state and in a “set” state, the memory material may be ina crystalline or semi-crystalline state. The resistance of the memorymaterial in the amorphous or semi-amorphous state may be greater thanthe resistance of the material in the crystalline or semi-crystallinestate. The association of reset and set with amorphous and crystallinestates, respectively, is a convention. Other conventions may be adopted.

Due to electrical current, the memory material may be heated to arelatively higher temperature to amorphisize memory material and “reset”memory material (e.g., program memory material to a logic “0” value).Heating the volume or memory material to a relatively lowercrystallization temperature may crystallize memory material and “set”memory material (e.g., program memory material to a logic “1” value).Various resistances of memory material may be achieved to storeinformation by varying the amount of current flow and duration throughthe volume of memory material.

The information stored in memory material 20 a may be read by measuringthe resistance of the memory material. As an example, a read current maybe provided to the memory material using opposed lines 22, 26 and aresulting read voltage across the memory material may be comparedagainst a reference voltage using, for example, a sense amplifier (notshown). The read voltage may be proportional to the resistance exhibitedby the memory storage element. Thus, a higher voltage may indicate thatmemory material is in a relatively higher resistance state, e.g., a“reset” state. A lower voltage may indicate that the memory material isin a relatively lower resistance state, e.g., a “set” state.

Referring to FIG. 2, a damascene process may be utilized to form thephase change memory in accordance with one embodiment of the presentinvention. A damascene process is an integrated circuit process by whicha pattern is embedded in a dielectric film on a substrate. Initially,over a substrate 10 that may define a select device 24 and a conductor26, an insulator 12 may be defined. A pore or aperture 14 may be formedthrough the insulating layer 12, for example, using conventional maskingand etching techniques.

The aperture 14 may then be filled with a suitable electrode 16. Theelectrode 16 may be any of a variety of materials utilized forelectrodes or heaters for phase change memories, such as metallicmaterials including tungsten, titanium nitride, and titanium siliconnitride. Any metal can be used, but for heating more resistive metalsmay be used. Suitable materials in some embodiments may includematerials that have high resistivity and low thermal conductivity. Thematerial 16 may be deposited into the aperture 14 and then the structuremay be polished to planarize the structure in some embodiments of thepresent invention.

Next, the recess 18 may be formed by dry or wet etching as indicated inFIG. 4. For example, a dilute acid etchant is highly selective of metal(e.g., the electrode 16) over oxide (e.g., the insulator 12). Forexample, 60 to 80 percent sulfuric acid may be used with hydrogenperoxide and water. An another example, ammonia hydroxide may be used.

As shown in FIG. 5, a layer of phase change material 20 may be depositedover the insulator 12 and filling the recess 18 in one embodiment of thepresent invention. As a result, in the stage shown in FIG. 5, the phasechange material 20 has a T-shaped configuration.

Turning next to FIG. 6, a portion of the phase change material 20overlying the insulator 12 may then be removed by polishing,planarizing, or dry etching, to mention a few examples. As a result, arelatively small amount of phase change material 20 a may be left by thedamascene process in the region defined by the recess 18.

In some embodiments of the present invention, the phase change material20 a may constitute less than half the vertical extent of the heater 16.In one embodiment of the present invention, the phase change material 20a may constitute less than 25 percent of the overall vertical extent ofthe insulator 12. In another embodiment, the phase change material 20 amay constitute about 10 percent or less of the vertical extent of theinsulator 12.

Thereafter, an upper electrode 22 may be defined-using suitable metaldeposition techniques or any other technique well known to those skilledin the art.

In accordance with some embodiments of the present invention, theresulting cell involves phase change material that is confined to arelatively small volume of a pore. The phase change material may beencapsulated and isolated from the rest of the circuitry. In addition,in some embodiments, the phase change material is not part of thebitline. This reduces the need for an adhesion layer and reduces theamount of phase change material on the wafer surface in someembodiments. In addition, in some embodiments, all the volume of thephase change material is switched from one state to the other.Therefore, the bit set resistance becomes saturated to a valueindependent of the programming current in the prior reset condition.This property may provide a reduced variation of set resistance acrossthe bits. In addition, in some embodiments, current flows between twosubstantially parallel plate electrodes providing uniform currentdensity.

Turning to FIG. 8, a portion of a system 500 in accordance with anembodiment of the present invention is described. System 500 may be usedin wireless devices such as, for example, a personal digital assistant(PDA), a laptop or portable computer with wireless capability, a webtablet, a wireless telephone, a pager, an instant messaging device, adigital music player, a digital camera, or other devices that may beadapted to transmit and/or receive information wirelessly. System 500may be used in any of the following systems: a wireless local areanetwork (WLAN) system, a wireless personal area network (WPAN) system,or a cellular network, although the scope of the present invention isnot limited in this respect.

System 500 may include a controller 510, an input/output (I/O) device520 (e.g. a keypad, display), a memory 530, and a wireless interface 540coupled to each other via a bus 550. It should be noted that the scopeof the present invention is not limited to embodiments having any or allof these components.

Controller 510 may comprise, for example, one or more microprocessors,digital signal processors, microcontrollers, or the like. Memory 530 maybe used to store messages transmitted to or by system 500. Memory 530may also optionally be used to store instructions that are executed bycontroller 510 during the operation of system 500, and may be used tostore user data. Memory 530 may be provided by one or more differenttypes of memory. For example, memory 530 may comprise a volatile memory(any type of random access memory), a non-volatile memory such as aflash memory, and/or phase change memory that includes a memory elementsuch as, for example, memory element 11 illustrated in FIG. 1.

The I/O device 520 may be used to generate a message. The system 500 mayuse the wireless interface 540 to transmit and receive messages to andfrom a wireless communication network with a radio frequency (RF)signal. Examples of the wireless interface 540 may include an antenna,or a wireless transceiver, such as a dipole antenna, although the scopeof the present invention is not limited in this respect.

While the present invention has been described with respect to a limitednumber of embodiments, those skilled in the art will appreciate numerousmodifications and variations therefrom. It is intended that the appendedclaims cover all such modifications and variations as fall within thetrue spirit and scope of this present invention.

1-10. (Canceled).
 11. A memory comprising: an insulator over asubstrate, said insulator including a pore having an electrode over thesubstrate and a phase change material over the electrode, wherein thephase change material fills less of the pore than the electrode.
 12. Thememory of claim 11 wherein said phase change material fills less than 25percent of the pore.
 13. The memory of claim 11 wherein said phasechange material fills about 10 percent or less of the pore.
 14. Thememory of claim 11 wherein said phase change material is entirelycontained within the pore.
 15. The memory of claim 11 wherein said phasechange material is a chalcogenide.
 16. The memory of claim 11, saidelectrode to act as a heater to heat said phase change material.
 17. Thememory of claim 11 wherein the phase change material is substantiallyco-planar with the upper surface of said insulator.
 18. The memory ofclaim 11 including a select device coupled to said electrode.
 19. Thememory of claim 11 including a conductive line formed over saidinsulator and said phase change material.
 20. The memory of claim 19wherein said phase change material is in contact with said conductiveline.
 21. The memory of claim 19 wherein said conductive line and theupper surface of said electrode are substantially parallel.
 22. A systemcomprising: a processor-based device; a wireless interface coupled tosaid processor-based device; and a semiconductor memory coupled to saiddevice, said memory including an insulator over a substrate, saidinsulator including a pore having an electrode over the substrate and aphase change material over the electrode wherein the phase changematerial fills less of the pore than the electrode.
 23. The system ofclaim 22 wherein said phase change material fills less than 25 percentof the pore.
 24. The system of claim 22 wherein said phase changematerial fills about 10 percent or less of the pore.
 25. A memorycomprising: an insulator over a substrate, said insulator including apore having an electrode over the substrate and a phase change materialover the electrode, wherein the phase change material is less than 25percent of the height of the pore.
 26. The memory of claim 25 whereinsaid phase change material is about 10 percent or less of the height ofthe pore.
 27. The memory of claim 26 wherein said phase change materialfills less of the pore than the electrode.
 28. The memory of claim 27wherein said phase change material fills about 10 percent or less of thepore.
 29. The memory of claim 25 wherein said phase change material isentirely contained within the pore.
 30. The memory of claim 29 includinga conductive line over said phase change material wherein saidconductive line and the upper surface of said electrode aresubstantially parallel.
 31. An apparatus comprising: a damascenestructure, wherein the damascene structure includes a first electrodeover a substrate and a phase change material over the first electrode;and a second electrode over the damascene structure.
 32. The apparatusof claim 31 wherein the damascene structure further comprises aninsulator having a pore over the substrate, wherein the first electrodeand the phase change material are formed in the pore.